Intern - Photolithograhy

Req. ID: 252864

Micron Technology’s vision is to transform how the world uses information to enrich life and our commitment to people, innovation, tenacity, collaboration, and customer focus allows us to fulfill our mission to be a global leader in memory and storage solutions. This means conducting business with integrity, accountability, and professionalism while supporting our global community.

As a Photolithography Technology Development intern in Boise, you will work on projects significant to current and future semiconductor manufacturing technology advancement to enable next generation products. You will collaborate with engineers in Photolithography, Metrology, Dry Etch, Wet Process, and other process areas. During the internship, you will complete two to three projects. Topics may cover photolithography simulations; extreme ultraviolet (EUV) lithography; line width roughness (LWR) improvements; overlay optimization etc.

Responsibilities may include, but are not limited to:

• Design of experiments (DOE) in chemical process specific to lithography, including optical simulations for 248 nm, 193 nm, 193 nm immersion, and EUV lithography.
• Plan and run experiments in our semiconductor cleanroom using state-of-the-art technology.
• Analyze images and data using in-house and commercial software. Data may include line width roughness (LWR), registration, cross sections, etc.
• Communicate plans, status, and results of projects in written reports and presentations, including the analysis and interpretation of data.

Qualifications:

• Coursework or experience in photolithography and semiconductor manufacturing preferred.
• Data Science, programming experience, and coursework/experience in statistics and data analysis are strongly preferred.
• Strong aptitude for research/development and ability to build production-worthy technologies.
• Capable of working independently and to complete projects in a timely manner.
• Work well in groups.
• Good analytical skills.
• Strong communication skills (written, verbal and presentation).

Education:

Applicants should be working towards a B.S. in Optical Engineering. Candidates must continue their education in Fall of 2021.

Note: Internship service dates are during the spring/summer of 2021

About Us

As the leader in innovative memory solutions, Micron is helping the world make sense of data by delivering technology that is transforming how the world uses information. Through our global brands - Micron, Crucial and Ballistix - we offer the industry's broadest portfolio. We are the only company manufacturing today's major memory and storage technologies: DRAM, NAND, NOR and 3D XPoint™ memory. Our solutions are purpose built to leverage the value of data to unlock financial insights, accelerate scientific break throughs and enhance communication around the world.

We recruit, hire, train, promote, discipline and provide other conditions of employment without regard to a person's race, color, religion, sex, age, national origin, disability, sexual orientation, gender identity and expression, pregnancy, veteran’s status, or other classifications protected under law. This includes providing reasonable accommodation for team members' disabilities or religious beliefs and practices.

Each manager, supervisor and team member is responsible for carrying out this policy. The EEO Administrator in Human Resources is responsible for administration of this policy. The administrator will monitor compliance and is available to answer any questions on EEO matters.

To request assistance with the application process, please contact Micron’s Human Resources Department at 1-800-336-8918 (or 208-368-4748).

Keywords: Boise || Idaho (US-ID) || United States (US) || Technology Development || Intern || Internship || Engineering || #LI-ML1 ||